Title :
Workshop and panel discussions
Author :
Gossner, Harald ; Gaertner, Reinhold ; Carn, Brett ; Blanc, Fabrice ; Gauthier, Robert ; Boselli, Gianluca ; Duvvury, Charvaka
Author_Institution :
Intel Mobil Communications
Abstract :
Due to downscaling of technology and increase of package size, a reduction in economically achievable CDM robustness of ICs is predicted. The workshop addresses the options and the status of CDM control in manufacturing and testing environments. The necessity of developing more advanced CDM control methods will be discussed. Another question is about the best way for world-wide implementation of advanced CDM control measures and the related costs.
Keywords :
Conferences; Electrostatic discharge; Foundries; IP networks; Integrated circuits; Manufacturing; Stress;
Conference_Titel :
Electrical Overstress/Electrostatic Discharge Symposium (EOS/ESD), 2011 33rd
Conference_Location :
Anaheim, CA
Electronic_ISBN :
Pending
