Title :
High-performance photonic crystal device fabrication process module development for photonics application
Author :
Wei, Deng ; Luo, X.S. ; Leekian, Ng ; Mingbin, Yu
Author_Institution :
Inst. of Microelectron., A*STAR (Agency for Sci., Technol. & Res.), Singapore, Singapore
Abstract :
We have developed a CMOS compatible fabrication process module for the controllable fabrication of high-performance photonic crystal devices using deep-UV photolithography. We will show the high-performance photonic crystal waveguides with air isolation trench underneath in order to achieve better light confinement. The demonstrated photonic crystal waveguides show only 8 dB/mm propagation loss.
Keywords :
CMOS integrated circuits; isolation technology; photonic crystals; ultraviolet lithography; waveguides; CMOS compatible fabrication process module; deep-UV photolithography; high-performance photonic crystal device fabrication; isolation trench; photonic crystal waveguides; process module development; Lithography; Optical device fabrication; Optical waveguides; Photonic crystals; Propagation losses;
Conference_Titel :
Electronics Packaging Technology Conference (EPTC), 2011 IEEE 13th
Conference_Location :
Singapore
Print_ISBN :
978-1-4577-1983-7
Electronic_ISBN :
978-1-4577-1981-3
DOI :
10.1109/EPTC.2011.6184418
