• DocumentCode
    1828095
  • Title

    Electrical analysis of unbalanced Flash memory array construction effects and their impact on performance and reliability

  • Author

    Seidel, K. ; Müller, T. ; Brandt, T. ; Hoffmann, R. ; Löhr, D.A. ; Melde, T. ; Czernohorsky, M. ; Paul, J. ; Beyer, V.

  • Author_Institution
    Fraunhofer Center Nanoelectronic Technol., Dresden, Germany
  • fYear
    2009
  • fDate
    25-28 Oct. 2009
  • Firstpage
    72
  • Lastpage
    76
  • Abstract
    In our work we present statistical methods and new memory array analysis approaches for decomposition and assessment of contributors to the Vth distribution widening. There, cell threshold voltage characteristics along bitlines and wordlines are considered as well as hidden systematic effects by convolutional analysis. Based on investigations on sub-50 nm floating gate NAND memory arrays we demonstrate an analysis method to distinguish between different reasons for broadened distributions by means of memory map analysis algorithms and filters. The impact of systematic threshold voltage and cell current variation in memory arrays caused by intrinsic circuit properties will be discussed.
  • Keywords
    NAND circuits; circuit reliability; convolution; flash memories; statistical analysis; cell current variation; convolutional analysis; distribution widening; electrical analysis; floating gate NAND memory arrays; memory map analysis algorithms; systematic threshold voltage; unbalanced flash memory array construction effects; Electron traps; Flash memory; Nonvolatile memory; Performance analysis; Pulse measurements; Size measurement; Stress; Telegraphy; Testing; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Non-Volatile Memory Technology Symposium (NVMTS), 2009 10th Annual
  • Conference_Location
    Portland, OR
  • Print_ISBN
    978-1-4244-4953-8
  • Electronic_ISBN
    978-1-4244-4954-5
  • Type

    conf

  • DOI
    10.1109/NVMT.2009.5429789
  • Filename
    5429789