DocumentCode :
1828204
Title :
A direct-conversion W-CDMA front-end SiGe receiver chip
Author :
Lie, D.Y.C. ; Kennedy, J. ; Livezey, D. ; Yang, B. ; Robinson, T. ; Sornin, N. ; Beukema, T. ; Larson, L.E. ; Senior, A. ; Saint, C. ; Blonski, J. ; Swanberg, N. ; Pawlowski, P. ; Gonya, D. ; Yuan, X. ; Zamat, H.
Author_Institution :
Commun. Res. & Dev. Center, IBM Microelectron., Encinitas, CA, USA
fYear :
2002
fDate :
3-4 June 2002
Firstpage :
31
Lastpage :
34
Abstract :
A W-CDMA direct-conversion front-end receiver chip consisting of a low-noise amplifier (LNA), a dual-gain RF variable-gain amplifier (RF-VGA), two direct-down-conversion mixers, a I/Q quadrature generator, and a base-band five-gain-stage VGA is designed and manufactured in a 0.25 /spl mu/m IBM SiGe BiCMOS production process. A very low DC offset value (<300 /spl mu/V) is measured at the output of the mixers as the LO signal is fed into the chip at twice the RF frequency. An extremely low local oscillator (LO) leakage of -105 dBm is measured at the LNA input, partly due to the excellent LO-to-RF isolation provided by the RF-VGA and the direct-conversion mixers. The measured cascaded noise figure for the chip (including the SAW filter) is 4.3 dB at the maximum gain mode, and the IIP2 and IIP3 are +37 and -16.5 dBm, respectively. The I/Q channels exhibit a small mismatch in magnitude (<0.1 dB) and in phase (1/spl deg/-1.5/spl deg/). The chip draws 24.9 mA from a 2.85V supply. The overall chip performance meets all the essential parameters of W-CDMA receiver front-end specs.
Keywords :
BiCMOS integrated circuits; Ge-Si alloys; code division multiple access; mobile radio; radio receivers; semiconductor materials; 0.25 micron; 2.85 V; 24.9 mA; 4.3 dB; DC offset; I/Q quadrature generator; IIP2; IIP3; LO leakage; LO-to-RF isolation; SAW filter; SiGe; SiGe BiCMOS process; base-band five-gain-stage VGA; direct-conversion W-CDMA front-end SiGe receiver chip; direct-down-conversion mixer; dual-gain RF variable-gain amplifier; low-noise amplifier; noise figure; BiCMOS integrated circuits; Germanium silicon alloys; Low-noise amplifiers; Manufacturing processes; Multiaccess communication; Production; Radio frequency; Radiofrequency amplifiers; Semiconductor device measurement; Silicon germanium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Radio Frequency Integrated Circuits (RFIC) Symposium, 2002 IEEE
Conference_Location :
Seattle, WA, USA
ISSN :
1529-2517
Print_ISBN :
0-7803-7246-8
Type :
conf
DOI :
10.1109/RFIC.2002.1011504
Filename :
1011504
Link To Document :
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