DocumentCode :
1829947
Title :
High-isolation BST-MEMS switches
Author :
Yu Liu ; Taylor, T.R. ; Speck, J.S. ; York, R.A.
Author_Institution :
Dept. of Electr. & Comput. Eng., California Univ., Santa Barbara, CA, USA
Volume :
1
fYear :
2002
fDate :
2-7 June 2002
Firstpage :
227
Abstract :
In this paper, emerging (Ba,Sr)TiO/sub 3/ thin film technology was investigated for enhancing RF-MEMS capacitive switches. Materials properties of high-permittivity BST thin films and fabrication issues are discussed. Prototype BST-MEMS switches for K-/Ka-band applications were fabricated and measured. This measured data is compared with measurements from conventional SiN-based MEMS switches, showing improved isolation at lower frequencies due to the higher down-state capacitance density.
Keywords :
barium compounds; ferroelectric thin films; micromechanical devices; microwave switches; permittivity; strontium compounds; (Ba,Sr)TiO/sub 3/ thin film technology; BST thin films; BaSrTiO/sub 3/; K-band applications; Ka-band applications; RF-MEMS capacitive switches; down-state capacitance density; high-isolation BST MEMS switches; high-permittivity thin films; Binary search trees; Capacitance measurement; Density measurement; Fabrication; Frequency measurement; Isolation technology; Material properties; Radiofrequency microelectromechanical systems; Switches; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Symposium Digest, 2002 IEEE MTT-S International
Conference_Location :
Seattle, WA, USA
ISSN :
0149-645X
Print_ISBN :
0-7803-7239-5
Type :
conf
DOI :
10.1109/MWSYM.2002.1011599
Filename :
1011599
Link To Document :
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