Title :
Notice of Retraction
Structural and optical properties of titanium oxide films as a function of films thickness
Author :
Kangarloo, H. ; Rafizadeh, S.
Author_Institution :
Fac. of Sci., I.A.U of Urmia Branch, Urmia, Iran
Abstract :
Notice of Retraction
After careful and considered review of the content of this paper by a duly constituted expert committee, this paper has been found to be in violation of IEEE´s Publication Principles.
We hereby retract the content of this paper. Reasonable effort should be made to remove all past references to this paper.
The presenting author of this paper has the option to appeal this decision by contacting TPII@ieee.org.
Titanium oxide thin films on glass substrates were prepared by resistance evaporation method under UHV conditions, with different 13, 30 and 58 nm thicknesses in room temperature. The structural and optical properties of the films were systematically examined. The nano-structure of the films were obtained using X-ray diffraction (XRD), and atomic force microscopy (AFM) and their optical properties were measured by spectrophotometer in the spectral range of 300-1100 nm. The optical functions were obtained from the Kramers-Kronig analysis of the reflectivity curves. From X-ray diffractometric measurements (XRD), it has been conformed that the films are amorphous in room temperature. the effect of thickness on nano crystalline Titanium oxides were studied with AFM images. Band-gap energy (Eg) was also estimated for these films.
Keywords :
Kramers-Kronig relations; X-ray diffraction; atomic force microscopy; energy gap; infrared spectra; nanostructured materials; noncrystalline structure; reflectivity; spectrophotometry; thin films; titanium compounds; ultraviolet spectra; visible spectra; AFM; Kramers-Kronig analysis; TiO2; UHV conditions; X-ray diffraction; XRD; amorphous films; atomic force microscopy; band-gap energy; films thickness; glass substrates; nanostructure; optical functions; optical properties; reflectivity curves; resistance evaporation; spectrophotometry; structural properties; temperature 293 K to 298 K; titanium oxide thin films; wavelength 300 nm to 1100 nm; Films; Photonic band gap; Shape; Thickness measurement; Ultrasonic variables measurement; AFM; Band-gap; Kramers-Kronig; Thin films; Titanium oxide; XRD; spectrophotometer;
Conference_Titel :
Mechanical and Electronics Engineering (ICMEE), 2010 2nd International Conference on
Conference_Location :
Kyoto
Print_ISBN :
978-1-4244-7479-0
DOI :
10.1109/ICMEE.2010.5558435
