Title :
Silicon micromachined RF MEMS resonators
Author :
Strohm, K.M. ; Schmuckle, F.J. ; Schauwecker, B. ; Luy, J.-F. ; Heinrich, W.
Author_Institution :
DaimlerChrysler Res. Center, Ulm, Germany
Abstract :
A new resonator concept based on a three dimensional (3D) high resistivity silicon substrate filled cavity resonators is investigated. Fabrication is done using micromachining technologies. Two types of resonators are investigated, an "open-end" patch resonator and a "short circuit via" resonator. Both types show good agreement in simulated and measured resonance frequencies (within 2%). However, measured quality factors (50-70) are still lower than the simulated values and theoretical expectations.
Keywords :
Q-factor; cavity resonators; elemental semiconductors; equivalent circuits; micromachining; micromechanical resonators; microwave devices; silicon; 3D high resistivity Si substrate; K-band; Si; Si MEMS resonators; Si substrate filled cavity resonators; micromachined RF MEMS resonators; micromachining fabrication technologies; microwave frequencies; open-end patch resonator; quality factors; resonance frequencies; short circuit via resonator; Cavity resonators; Circuit simulation; Conductivity; Fabrication; Frequency measurement; Micromachining; Radiofrequency microelectromechanical systems; Resonance; Resonant frequency; Silicon;
Conference_Titel :
Microwave Symposium Digest, 2002 IEEE MTT-S International
Conference_Location :
Seattle, WA, USA
Print_ISBN :
0-7803-7239-5
DOI :
10.1109/MWSYM.2002.1011873
