• DocumentCode
    183772
  • Title

    Integration challenges for high-performance carbon nanotube logic

  • Author

    Hannon, James B. ; Park, Heejung ; Tulevski, George S. ; Haensch, Wilfried

  • Author_Institution
    Res. Div., T.J. Watson Res. Center, IBM, Yorktown Heights, NY, USA
  • fYear
    2014
  • fDate
    Sept. 28 2014-Oct. 1 2014
  • Firstpage
    123
  • Lastpage
    127
  • Abstract
    As the scaling of silicon-based devices becomes more challenging, alternative channel materials are being actively explored. One approach is to replace the silicon channel with nanoparticles - for example, carbon nanotubes - that offer higher performance and better scaling potential. However, the incorporation of nanoparticles requires the development of new “bottom up” fabrication techniques to grow or place particles at precise locations on a substrate. The inherent randomness of these assembly processes has an obvious impact on device yield, which must be taken into account in optimizing the layout of a device. Here we describe a simple statistical analysis of device yield that can give insight into the self-assembly process, and is particularly useful for characterizing nanoparticle self-assembly from solution.
  • Keywords
    carbon nanotubes; integrated circuit yield; nanoparticles; self-assembly; statistical analysis; assembly processes; bottom up fabrication techniques; carbon nanotube logic; device yield; nanoparticles; self-assembly process; silicon channel; silicon-based devices scaling; statistical analysis; Carbon nanotubes; Hafnium compounds; Nanoparticles; Sociology; Statistics; Substrates; Surface treatment; carbon nanotubes; nanoparticles; placement; self assembly;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Bipolar/BiCMOS Circuits and Technology Meeting (BCTM), 2014 IEEE
  • Conference_Location
    Coronado, CA
  • Type

    conf

  • DOI
    10.1109/BCTM.2014.6981298
  • Filename
    6981298