Title :
Ultimate miniturization of plasmonic travelling-wave resonators
Author :
Zhou, Haifeng ; Luo, Xianshu ; Zhu, Shiyang ; Lo, Guoqiang
Author_Institution :
Inst. of Microelectron., A*STAR (Agency for Sci., Technol. & Res.), Singapore, Singapore
Abstract :
By virtue of the origin of mode resonances, we made comparison analysis for sub-micron pure Si disk cavities and metal-capped Si disks that would be demonstrated by the matured CMOS technologies. A notch filter composed of a 500nm-radius metal-capped disk was numerically demonstrated by using our finite difference time domain codes.
Keywords :
CMOS integrated circuits; elemental semiconductors; finite difference time-domain analysis; notch filters; plasmonics; resonators; silicon; Si; finite difference time domain code; matured CMOS technology; metal-capped disk; mode resonance origin; notch filter; plasmonic travelling-wave resonator; size 50 nm; submicron pure disk cavity; ultimate miniturization; Finite difference methods; Optical ring resonators; Plasmons; Resonant frequency; Silicon; Time domain analysis;
Conference_Titel :
Antennas and Propagation (APCAP), 2012 IEEE Asia-Pacific Conference on
Conference_Location :
Singapore
Print_ISBN :
978-1-4673-0666-9
DOI :
10.1109/APCAP.2012.6333183
