The economic impact of choosing off-line, inline or in situ metrology deployment in semiconductor manufacturing

Author

Spanos, Costas J. ; Jula, Payman ; Leachman, Robert C.

Author_Institution

Dept. of Electr. Eng., California Univ., Berkeley, CA, USA

fYear

2001

fDate

2001

Firstpage

37

Lastpage

40

Abstract

Metrology tools and practices are expected to migrate from off-line to inline and ultimately to in situ. Economic models are needed to study the costs and benefits of introducing new metrology technologies and to compare alternative metrology practices. Several qualitative and quantitative models are presented in this paper to study the elements of revenue and cost associated with different metrology tools and practices. Comparisons between in situ, inline and off-line metrology systems are made. Monte Carlo simulation models are used to study each system under different scenarios

Keywords

Monte Carlo methods; cost-benefit analysis; integrated circuit economics; integrated circuit measurement; production testing; semiconductor process modelling; Monte Carlo simulation models; cost; economic impact; economic models; in-line metrology deployment; in-situ metrology deployment; metrology practices; metrology systems; metrology technologies; metrology tools; off-line metrology deployment; qualitative models; quantitative models; revenue; semiconductor manufacturing; system scenarios; Analytical models; Computer aided manufacturing; Costs; Economics; Lithography; Mathematical model; Metrology; Operations research; Semiconductor device manufacture; Virtual manufacturing;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Manufacturing Symposium, 2001 IEEE International

Conference_Location

San Jose, CA

Print_ISBN

0-7803-6731-6

Type

conf

DOI

10.1109/ISSM.2001.962909

Filename

962909