DocumentCode :
1838013
Title :
The economic impact of choosing off-line, inline or in situ metrology deployment in semiconductor manufacturing
Author :
Spanos, Costas J. ; Jula, Payman ; Leachman, Robert C.
Author_Institution :
Dept. of Electr. Eng., California Univ., Berkeley, CA, USA
fYear :
2001
fDate :
2001
Firstpage :
37
Lastpage :
40
Abstract :
Metrology tools and practices are expected to migrate from off-line to inline and ultimately to in situ. Economic models are needed to study the costs and benefits of introducing new metrology technologies and to compare alternative metrology practices. Several qualitative and quantitative models are presented in this paper to study the elements of revenue and cost associated with different metrology tools and practices. Comparisons between in situ, inline and off-line metrology systems are made. Monte Carlo simulation models are used to study each system under different scenarios
Keywords :
Monte Carlo methods; cost-benefit analysis; integrated circuit economics; integrated circuit measurement; production testing; semiconductor process modelling; Monte Carlo simulation models; cost; economic impact; economic models; in-line metrology deployment; in-situ metrology deployment; metrology practices; metrology systems; metrology technologies; metrology tools; off-line metrology deployment; qualitative models; quantitative models; revenue; semiconductor manufacturing; system scenarios; Analytical models; Computer aided manufacturing; Costs; Economics; Lithography; Mathematical model; Metrology; Operations research; Semiconductor device manufacture; Virtual manufacturing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing Symposium, 2001 IEEE International
Conference_Location :
San Jose, CA
Print_ISBN :
0-7803-6731-6
Type :
conf
DOI :
10.1109/ISSM.2001.962909
Filename :
962909
Link To Document :
بازگشت