Title :
Flange correction to four-terminal contact resistance measurements
Author :
Lieneweg, Udo ; Hannaman, David J.
Author_Institution :
Jet Propulsion Lab., California Inst. of Technol., Pasadena, CA, USA
Abstract :
A heuristic model for flange correction to four-terminal measurements of the interfacial resistance in square contacts between a semiconducting and a metal layer, or between metal layers is presented. The model reproduces results from experiments with geometric variations when a constant interfacial resistivity is fitted, and compares well to simulations.<>
Keywords :
contact resistance; electric resistance measurement; electrical contacts; ohmic contacts; constant interfacial resistivity; experiments; flange correction; four-terminal contact resistance measurements; geometric variations; heuristic model; interfacial resistance; square contacts; Circuit testing; Conductivity; Contact resistance; Current measurement; Electrical resistance measurement; Flanges; Fluid flow measurement; Laboratories; Propulsion; Solid modeling;
Conference_Titel :
Microelectronic Test Structures, 1990. ICMTS 1990. Proceedings of the 1990 International Conference on
Conference_Location :
San Diego, CA, USA
DOI :
10.1109/ICMTS.1990.67875
