• DocumentCode
    1838491
  • Title

    Physics and chemistry of partial discharge and corona - recent advances and future challenges

  • Author

    Van Brunt, R.J.

  • Author_Institution
    Nat. Inst. of Stand. & Technol., Gaithersburg, MD, USA
  • fYear
    1994
  • fDate
    23-26 Oct 1994
  • Firstpage
    29
  • Lastpage
    70
  • Abstract
    The focus of the present review is on relatively recent work published within the past fifteen years dealing primarily with the basic physical and chemical processes responsible for, or associated with, the discharge phenomenon. Particular emphasis is given to work carried out in the NIST laboratory using examples of results obtained for air, SF 6, and SF6/O2 gas mixtures in point-plane or point-dielectric barrier gaps
  • Keywords
    partial discharges; NIST laboratory; O2; SF6; SF6-O2; SF6/O2 gas mixtures; air; chemical processes; corona; discharge phenomenon; partial discharge; physical processes; point-dielectric barrier gaps; point-plane gaps; Chemistry; Conducting materials; Corona; Dielectric materials; Dielectrics and electrical insulation; Gas insulation; Partial discharges; Physics; Pulse measurements; Signal processing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrical Insulation and Dielectric Phenomena, 1994., IEEE 1994 Annual Report., Conference on
  • Conference_Location
    Arlington, TX
  • Print_ISBN
    0-7803-1950-8
  • Type

    conf

  • DOI
    10.1109/CEIDP.1994.591675
  • Filename
    591675
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1838491