DocumentCode :
1838712
Title :
Infrastructure for successful BEOL characterization and yield ramp at the 65 nm node and below
Author :
DeBord, Jeffrey R D ; Grice, Tom ; Garcia, Roberto ; Yeric, Greg ; Cohen, Ethan ; Sutandi, Augustinus ; Garcia, John ; Green, Gary
Author_Institution :
Texas Instrum. Inc., Dallas, TX, USA
fYear :
2005
fDate :
6-8 June 2005
Firstpage :
27
Lastpage :
29
Abstract :
BEOL yield characterization is increasingly difficult on advanced technology nodes using traditional short flow devices. A new BEOL technology development read only memory (TDROM™) has been used to successfully drive BEOL yield learning on the 65 nm node. The addressable nature of the TDROM™ allows isolation of all fails to within 2 um2 using known memory testing techniques which has resulted in accelerated yield learning, and PFA utilization. The eight megabit array size allows exhaustive DOE for all design rules and margins.
Keywords :
integrated circuit yield; read-only storage; 65 nm; BEOL technology development read only memory; BEOL yield characterization; DOE; PFA utilization; TDROM; accelerated yield learning; array size; memory testing; yield ramp; Inorganic materials; Instruments; Isolation technology; Life estimation; Materials testing; Metallization; Metals industry; Read only memory; Vehicles; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Interconnect Technology Conference, 2005. Proceedings of the IEEE 2005 International
Print_ISBN :
0-7803-8752-X
Type :
conf
DOI :
10.1109/IITC.2005.1499912
Filename :
1499912
Link To Document :
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