• DocumentCode
    1838882
  • Title

    Effects of friction and loading parameters on four-point bend adhesion measurements of low-k thin film interconnect structures

  • Author

    Gage, David M. ; Kim, Kyunghoon ; Litteken, Christopher S. ; Dauskardt, Reinhold H.

  • Author_Institution
    Dept. of Mater. Sci. & Eng., Stanford Univ., CA, USA
  • fYear
    2005
  • fDate
    6-8 June 2005
  • Firstpage
    42
  • Lastpage
    44
  • Abstract
    The four-point bend method has become an established metrology for quantitatively examining interfacial fracture energies of thin film multi-layers. However, despite the widespread use of the technique, relatively little is known about how four-point measurements are affected by loading point friction and variations in readily adjustable loading parameters. In this study, we demonstrate that four-point measurements can be sensitive to applied loading geometry and factors that affect the rate of steady state debond propagation. These effects can be experimentally significant, particularly for fracture energy measurements above ∼5 J/m2. We show that this behavior is due to a combination of Coulomb friction and stress corrosion effects. Good practice testing guidelines are suggested to systematically improve accuracy and consistency of four-point data.
  • Keywords
    adhesion; dielectric thin films; fracture toughness testing; friction; integrated circuit interconnections; integrated circuit testing; stress corrosion cracking; Coulomb friction; applied loading geometry; four-point bend adhesion measurement method; fracture energy; friction effects; interfacial fracture energies; loading parameter effects; loading point friction; low-k thin film interconnect structures; steady state debond propagation rate; stress corrosion effects; thin film multilayers; Adhesives; Corrosion; Energy measurement; Friction; Geometry; Metrology; Steady-state; Stress; System testing; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Interconnect Technology Conference, 2005. Proceedings of the IEEE 2005 International
  • Print_ISBN
    0-7803-8752-X
  • Type

    conf

  • DOI
    10.1109/IITC.2005.1499917
  • Filename
    1499917