• DocumentCode
    1839707
  • Title

    The spidermask: a new approach for yield monitoring using product adaptable test structures

  • Author

    Beckers, S. ; Hiltrop, C.

  • Author_Institution
    Mietec NV, Oudenaarde, Belgium
  • fYear
    1990
  • fDate
    5-7 March 1990
  • Firstpage
    61
  • Lastpage
    66
  • Abstract
    An approach for yield monitoring based on a test vehicle that consists of structures, built on the underground of a high volume product is described. A specially designed metal mask, called spidermask, together with its appropriate contact mask, isolates and contacts these individual structures to create a complete yield monitor set. The major advantage of this type of structure is the close relationship between the measurement results on the test structure itself and the actual performance of the corresponding product. As a consequence, the existing yield model is adapted to conform to the yield monitor data. The spidermask was implemented in a CMOS and in a mixed bipolar-CMOS technology. The data of both yield monitors are presented, and the relationship with the yield model is demonstrated.<>
  • Keywords
    BIMOS integrated circuits; CMOS integrated circuits; integrated circuit testing; BiCMOS; CMOS; bipolar-CMOS technology; contact mask; high volume product; metal mask; product adaptable test structures; spidermask; test vehicle; yield model; yield monitoring; CMOS technology; Circuit testing; Integrated circuit modeling; Integrated circuit testing; Monitoring; Performance evaluation; Product design; Production; Semiconductor device modeling; Vehicles;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronic Test Structures, 1990. ICMTS 1990. Proceedings of the 1990 International Conference on
  • Conference_Location
    San Diego, CA, USA
  • Type

    conf

  • DOI
    10.1109/ICMTS.1990.67881
  • Filename
    67881