Title :
Controlling Ru airborne contamination in cleanroom
Author :
Shimazaki, Ayako ; Sakurai, Hiroki ; Nishiki, Kazuhiro ; Nadahara, Soichi
Author_Institution :
Semicond. Co., Toshiba Corp., Yokohama, Japan
Abstract :
It was revealed that Ru chemical vapor deposition (CVD) furnace affected cleanliness of "ball room" type cleanroom. Ru airborne contamination behaves as mists or molecules unlike Fe contamination which behaves as particles. Ru contamination is accumulated in the cleanroom and it is easy to spread and to circulate as airborne contamination in the cleanroom. Completely closed system of Ru CVD furnace should be developed to shut out Ru contamination. It was found that activated carbon filter (AC) was effective to trap this Ru airborne contamination for mini-environment system of the manufacturing equipments in the "ball room" type cleanroom for production
Keywords :
chemical vapour deposition; clean rooms; filtration; furnaces; ruthenium; surface contamination; C; Ru; Ru CVD furnace; Ru airborne contamination; activated carbon filter; ball room; cleanroom; manufacturing equipment; mini-environment system; Atomic measurements; Chemical vapor deposition; Filters; Furnaces; Iron; Plasma measurements; Pollution measurement; Production systems; Semiconductor impurities; Surface contamination;
Conference_Titel :
Semiconductor Manufacturing Symposium, 2001 IEEE International
Conference_Location :
San Jose, CA
Print_ISBN :
0-7803-6731-6
DOI :
10.1109/ISSM.2001.962980
