Controlling Ru airborne contamination in cleanroom

Author

Shimazaki, Ayako ; Sakurai, Hiroki ; Nishiki, Kazuhiro ; Nadahara, Soichi

Author_Institution

Semicond. Co., Toshiba Corp., Yokohama, Japan

fYear

2001

fDate

2001

Firstpage

333

Lastpage

336

Abstract

It was revealed that Ru chemical vapor deposition (CVD) furnace affected cleanliness of "ball room" type cleanroom. Ru airborne contamination behaves as mists or molecules unlike Fe contamination which behaves as particles. Ru contamination is accumulated in the cleanroom and it is easy to spread and to circulate as airborne contamination in the cleanroom. Completely closed system of Ru CVD furnace should be developed to shut out Ru contamination. It was found that activated carbon filter (AC) was effective to trap this Ru airborne contamination for mini-environment system of the manufacturing equipments in the "ball room" type cleanroom for production

Keywords

chemical vapour deposition; clean rooms; filtration; furnaces; ruthenium; surface contamination; C; Ru; Ru CVD furnace; Ru airborne contamination; activated carbon filter; ball room; cleanroom; manufacturing equipment; mini-environment system; Atomic measurements; Chemical vapor deposition; Filters; Furnaces; Iron; Plasma measurements; Pollution measurement; Production systems; Semiconductor impurities; Surface contamination;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Manufacturing Symposium, 2001 IEEE International

Conference_Location

San Jose, CA

Print_ISBN

0-7803-6731-6

Type

conf

DOI

10.1109/ISSM.2001.962980

Filename

962980