DocumentCode :
1840250
Title :
300 mm factory automation experience and challenges for wafer foundry fabs
Author :
Hung, Chin-Hui ; Lin, Li-Ren
Author_Institution :
Taiwan Semicond. Manuf. Co. Ltd., Taiwan
fYear :
2001
fDate :
2001
Firstpage :
377
Lastpage :
380
Abstract :
As the semiconductor industry increases interest in 300 mm wafer size transition, Taiwan Semiconductor Manufacturing Company (TSMC) is also participating in the 300 mm development and mass production. TSMC uses a pilot line of 4.5 K monthly output capacity to gain process and tool expertise and to develop appropriate 300 mm factory automation know-how for the set-up of the next mass production 300 mm fabs. The goal is to achieve or exceed the current 200 mm foundry service, which offers leading edge technology, good on-time delivery, and excellent product quality for 300 mm fabs. A lot of experience has been learned and some challenges have been identified after operating this 300 mm pilot line for one year. These experiences and challenges are discussed in this paper
Keywords :
computer integrated manufacturing; integrated circuit manufacture; quality control; 300 mm; TSMC; Taiwan Semiconductor Manufacturing Company; factory automation; leading edge technology; mass production; on-time delivery; product quality; wafer foundry fabs; wafer size; Computer integrated manufacturing; Copper; Electronics industry; Foundries; Manufacturing automation; Mass production; Materials handling; Production systems; Safety; Semiconductor device manufacture;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing Symposium, 2001 IEEE International
Conference_Location :
San Jose, CA
Print_ISBN :
0-7803-6731-6
Type :
conf
DOI :
10.1109/ISSM.2001.962994
Filename :
962994
Link To Document :
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