• DocumentCode
    1840250
  • Title

    300 mm factory automation experience and challenges for wafer foundry fabs

  • Author

    Hung, Chin-Hui ; Lin, Li-Ren

  • Author_Institution
    Taiwan Semicond. Manuf. Co. Ltd., Taiwan
  • fYear
    2001
  • fDate
    2001
  • Firstpage
    377
  • Lastpage
    380
  • Abstract
    As the semiconductor industry increases interest in 300 mm wafer size transition, Taiwan Semiconductor Manufacturing Company (TSMC) is also participating in the 300 mm development and mass production. TSMC uses a pilot line of 4.5 K monthly output capacity to gain process and tool expertise and to develop appropriate 300 mm factory automation know-how for the set-up of the next mass production 300 mm fabs. The goal is to achieve or exceed the current 200 mm foundry service, which offers leading edge technology, good on-time delivery, and excellent product quality for 300 mm fabs. A lot of experience has been learned and some challenges have been identified after operating this 300 mm pilot line for one year. These experiences and challenges are discussed in this paper
  • Keywords
    computer integrated manufacturing; integrated circuit manufacture; quality control; 300 mm; TSMC; Taiwan Semiconductor Manufacturing Company; factory automation; leading edge technology; mass production; on-time delivery; product quality; wafer foundry fabs; wafer size; Computer integrated manufacturing; Copper; Electronics industry; Foundries; Manufacturing automation; Mass production; Materials handling; Production systems; Safety; Semiconductor device manufacture;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing Symposium, 2001 IEEE International
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    0-7803-6731-6
  • Type

    conf

  • DOI
    10.1109/ISSM.2001.962994
  • Filename
    962994