Title :
Advanced PSA Bipolar Transistors for Wireless Applications: Measurements of Scattering Parameters and Noise Figure
Author :
Caddemi, A. ; Sannino, M.
Author_Institution :
Dipartimento di Ingegneria Elettrica - University of Palermo, Viale delle Scienze - 90128 Palermo - Italy
Abstract :
A complete investigation on the performance of a series of double polysilicon self-aligned (PSA) bipolar transistors in terms of scattering parameters and noise figure is here reported. The devices have been characterized over the 1-4 GHz frequency range in several bias conditions to the aim of assessing the optimum bias values for the best trade-off between noise and gain performance. This is the first part of an extensive investigation currently performed on 5 families of PSA devices having different emitter configuration and size which have been manufactured by SGS-Thomson to undergo a comparative analysis on the global transistor performance.
Keywords :
Bipolar transistors; Frequency; Integrated circuit noise; Manufacturing; Noise figure; Noise measurement; Performance gain; Scattering parameters; Semiconductor device measurement; Testing;
Conference_Titel :
ARFTG Conference Digest-Fall, 44th
Conference_Location :
Boulder, CO, USA
Print_ISBN :
0-7803-5686-1
DOI :
10.1109/ARFTG.1994.327086