Title :
The practical use of residual gas analysis in a semiconductor thermal processing module
Author :
Hashem, Jimmy ; Bradshaw, Brian
Author_Institution :
Texas Instrum. Inc., Dallas, TX, USA
Abstract :
In this paper, we will discuss the application of a portable Residual Gas Analyzer (RGA) for characterizing and troubleshooting diffusion furnaces and rapid thermal anneal (RTA) reactors in the thermal module at Kilby Fab (KFAB) of Texas Instruments Inc. The tools characterized were Tokyo Electron Ltd. (TEL) vertical atmospheric furnaces, TEL vertical LPCVD furnaces and Applied Materials (AMAT) Rapid Thermal Annealers and Rapid Thermal Processors. Some aspects of the coordination of this operation in a manufacturing environment will also be discussed
Keywords :
chemical analysis; chemical vapour deposition; furnaces; portable instruments; rapid thermal annealing; semiconductor technology; diffusion furnace; portable residual gas analyzer; rapid thermal anneal reactor; rapid thermal annealer; rapid thermal processor; residual gas analysis; semiconductor manufacturing; semiconductor thermal processing module; vertical LPCVD furnace; vertical atmospheric furnace; Chemistry; Furnaces; Inductors; Instruments; Monitoring; Pressure control; Rapid thermal annealing; Rapid thermal processing; Sampling methods; Semiconductor device manufacture;
Conference_Titel :
Semiconductor Manufacturing Symposium, 2001 IEEE International
Conference_Location :
San Jose, CA
Print_ISBN :
0-7803-6731-6
DOI :
10.1109/ISSM.2001.963005
