Photoresist developer reclamation technology and system

Author

Sugawara, Hiroshi ; Tajima, Yoshinori ; Ohmi, Tadahiro

Author_Institution

Dept. of Electr. Eng., Tohoku Univ., Sendai, Japan

fYear

2001

fDate

2001

Firstpage

481

Lastpage

484

Abstract

A tetramethylammonium hydroxide (TMAH) generally used as photoresist developer for manufacturing LSIs and LCDs is recovered from developer waste (spent developer) using an electrodialysis (ED) method, and purified by ion exchange (IE) technologies. Reclaimed developer features analytically the same purity as commercial fresh one. This reclamation system can achieve a stably high TMAH recovery rate of more than 80%. Furthermore, it has the great advantages of saving operating costs, which amounts to 66.2% (for LSI) and 78.3% (for LCD) total cost reduction compared with conventional no reclamation system in a case study, as well as reducing environmental load

Keywords

VLSI; integrated circuit manufacture; ion exchange; large scale integration; liquid crystal displays; photoresists; recycling; LCD manufacturing; TMAH; VLSI manufacturing; developer waste; electrodialysis method; environmental load reduction; ion exchange technologies; operating costs reduction; photoresist developer reclamation system; photoresist developer reclamation technology; purification; tetramethylammonium hydroxide; Chemical processes; Costs; Electronics industry; Industrial electronics; Large scale integration; Manufacturing industries; Manufacturing processes; Purification; Resists; Wastewater treatment;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Manufacturing Symposium, 2001 IEEE International

Conference_Location

San Jose, CA

Print_ISBN

0-7803-6731-6

Type

conf

DOI

10.1109/ISSM.2001.963020

Filename

963020