Title :
Photoresist developer reclamation technology and system
Author :
Sugawara, Hiroshi ; Tajima, Yoshinori ; Ohmi, Tadahiro
Author_Institution :
Dept. of Electr. Eng., Tohoku Univ., Sendai, Japan
Abstract :
A tetramethylammonium hydroxide (TMAH) generally used as photoresist developer for manufacturing LSIs and LCDs is recovered from developer waste (spent developer) using an electrodialysis (ED) method, and purified by ion exchange (IE) technologies. Reclaimed developer features analytically the same purity as commercial fresh one. This reclamation system can achieve a stably high TMAH recovery rate of more than 80%. Furthermore, it has the great advantages of saving operating costs, which amounts to 66.2% (for LSI) and 78.3% (for LCD) total cost reduction compared with conventional no reclamation system in a case study, as well as reducing environmental load
Keywords :
VLSI; integrated circuit manufacture; ion exchange; large scale integration; liquid crystal displays; photoresists; recycling; LCD manufacturing; TMAH; VLSI manufacturing; developer waste; electrodialysis method; environmental load reduction; ion exchange technologies; operating costs reduction; photoresist developer reclamation system; photoresist developer reclamation technology; purification; tetramethylammonium hydroxide; Chemical processes; Costs; Electronics industry; Industrial electronics; Large scale integration; Manufacturing industries; Manufacturing processes; Purification; Resists; Wastewater treatment;
Conference_Titel :
Semiconductor Manufacturing Symposium, 2001 IEEE International
Conference_Location :
San Jose, CA
Print_ISBN :
0-7803-6731-6
DOI :
10.1109/ISSM.2001.963020
