DocumentCode
1842659
Title
AlGaN/GaN HFET amplifier performance and limitations
Author
Trew, R.J.
Author_Institution
ECE Dept., Virginia Polytech. Inst. & State Univ., Blacksburg, VA, USA
Volume
3
fYear
2002
fDate
2-7 June 2002
Firstpage
1811
Abstract
Wide bandgap semiconductor field-effect transistors based upon the AlGaN/GaN heterostructure often demonstrate premature saturation and degradation of the RF output power, power-added efficiency, and gain as the device is driven into saturation. The effect is generally accompanied by ´current slump´, where the dc current decreases with increasing RF drive. It is demonstrated that charge non-confinement in the 2DEG under large-signal conditions can produce source resistance modulation that degrades RF performance consistent with experimental data.
Keywords
III-V semiconductors; JFET circuits; aluminium compounds; gallium compounds; power amplifiers; radiofrequency amplifiers; wide band gap semiconductors; 2DEG; AlGaN-GaN; AlGaN/GaN HFET amplifier; RF output power; charge nonconfinement; current slump; gain; large-signal characteristics; power added efficiency; premature saturation; source resistance modulation; wide band gap semiconductor; Aluminum gallium nitride; Degradation; FETs; Gallium nitride; HEMTs; MODFETs; Power generation; Radio frequency; Radiofrequency amplifiers; Wide band gap semiconductors;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave Symposium Digest, 2002 IEEE MTT-S International
Conference_Location
Seattle, WA, USA
ISSN
0149-645X
Print_ISBN
0-7803-7239-5
Type
conf
DOI
10.1109/MWSYM.2002.1012214
Filename
1012214
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