• DocumentCode
    1842659
  • Title

    AlGaN/GaN HFET amplifier performance and limitations

  • Author

    Trew, R.J.

  • Author_Institution
    ECE Dept., Virginia Polytech. Inst. & State Univ., Blacksburg, VA, USA
  • Volume
    3
  • fYear
    2002
  • fDate
    2-7 June 2002
  • Firstpage
    1811
  • Abstract
    Wide bandgap semiconductor field-effect transistors based upon the AlGaN/GaN heterostructure often demonstrate premature saturation and degradation of the RF output power, power-added efficiency, and gain as the device is driven into saturation. The effect is generally accompanied by ´current slump´, where the dc current decreases with increasing RF drive. It is demonstrated that charge non-confinement in the 2DEG under large-signal conditions can produce source resistance modulation that degrades RF performance consistent with experimental data.
  • Keywords
    III-V semiconductors; JFET circuits; aluminium compounds; gallium compounds; power amplifiers; radiofrequency amplifiers; wide band gap semiconductors; 2DEG; AlGaN-GaN; AlGaN/GaN HFET amplifier; RF output power; charge nonconfinement; current slump; gain; large-signal characteristics; power added efficiency; premature saturation; source resistance modulation; wide band gap semiconductor; Aluminum gallium nitride; Degradation; FETs; Gallium nitride; HEMTs; MODFETs; Power generation; Radio frequency; Radiofrequency amplifiers; Wide band gap semiconductors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Symposium Digest, 2002 IEEE MTT-S International
  • Conference_Location
    Seattle, WA, USA
  • ISSN
    0149-645X
  • Print_ISBN
    0-7803-7239-5
  • Type

    conf

  • DOI
    10.1109/MWSYM.2002.1012214
  • Filename
    1012214