DocumentCode
1842764
Title
Rare-earth doped silica planar waveguide lasers fabricated by flame hydrolysis deposition and reactive ion etching
Author
Bonar, J.R. ; Bebbbington, J.A. ; Aitchison, J.S. ; Maxwell, G.D. ; Ainslie, B.J.
Author_Institution
Glasgow Univ., UK
fYear
1994
fDate
34631
Firstpage
42522
Lastpage
42525
Abstract
Our results on both solution doped and aerosol doped silica waveguide lasers have been described. Using the solution doping technique and optimising the output coupling a Nd-doped laser with a slope efficiency of 10 % has been demonstrated. This figure is greater than has been observed before . Laser oscillation using the aerosol doping technique has also been observed for the first time. It is envisaged that monolithic integration of both active and passive devices will be possible using selective area doping techniques and grating structures
Keywords
diffraction gratings; 10 percent; active devices; aerosol doped; flame hydrolysis deposition; grating structures; laser oscillation; monolithic integration; output coupling; passive devices; rare-earth doped silica planar waveguide laser fabrication; reactive ion etching; selective area doping techniques; slope efficiency; solution doped;
fLanguage
English
Publisher
iet
Conference_Titel
Planar Silicon Hybrid Optoelectronics (Digest No. 1994/198), IEE Colloquium on
Conference_Location
London
Type
conf
Filename
678963
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