• DocumentCode
    1842764
  • Title

    Rare-earth doped silica planar waveguide lasers fabricated by flame hydrolysis deposition and reactive ion etching

  • Author

    Bonar, J.R. ; Bebbbington, J.A. ; Aitchison, J.S. ; Maxwell, G.D. ; Ainslie, B.J.

  • Author_Institution
    Glasgow Univ., UK
  • fYear
    1994
  • fDate
    34631
  • Firstpage
    42522
  • Lastpage
    42525
  • Abstract
    Our results on both solution doped and aerosol doped silica waveguide lasers have been described. Using the solution doping technique and optimising the output coupling a Nd-doped laser with a slope efficiency of 10 % has been demonstrated. This figure is greater than has been observed before . Laser oscillation using the aerosol doping technique has also been observed for the first time. It is envisaged that monolithic integration of both active and passive devices will be possible using selective area doping techniques and grating structures
  • Keywords
    diffraction gratings; 10 percent; active devices; aerosol doped; flame hydrolysis deposition; grating structures; laser oscillation; monolithic integration; output coupling; passive devices; rare-earth doped silica planar waveguide laser fabrication; reactive ion etching; selective area doping techniques; slope efficiency; solution doped;
  • fLanguage
    English
  • Publisher
    iet
  • Conference_Titel
    Planar Silicon Hybrid Optoelectronics (Digest No. 1994/198), IEE Colloquium on
  • Conference_Location
    London
  • Type

    conf

  • Filename
    678963