Title :
The application of AI techniques to the control and interpretation of C-V measurements
Author :
Walls, J.A. ; Walton, A.J. ; Robertson, J.M.
Author_Institution :
Edinburgh Microfabrication Facility, UK
Abstract :
Pattern-recognition and knowledge-based techniques are applied to help advance the interpretation of capacitance-voltage (C-V) curves. This is implemented by integrating instrument control software with an expert system shell to intelligently sequence tests to enhance conventional measurements. A prototype system is able to correctly identify a number of process faults, including a leaky oxide, as described in examples. In this instance some useful information could be obtained and a warning issued to the operator about the possible inaccuracy of some of the other parameters. Moreover, further analyses are disabled on account of the sample being inappropriate for their assumed equivalent circuit models. Other examples illustrate the improvements to be gained from measurements simply by recognizing the important factors in a single C-V measurement.<>
Keywords :
MOS integrated circuits; capacitance measurement; computerised pattern recognition; electronic engineering computing; integrated circuit manufacture; integrated circuit testing; knowledge based systems; metal-insulator-semiconductor structures; process computer control; AI techniques; capacitance voltage curves; expert system shell; integrating instrument control software; intelligently sequence tests; interpretation of C-V measurements; knowledge-based techniques; leaky oxide; measurement control; pattern recognition techniques; process faults identification; prototype system; Application software; Artificial intelligence; Capacitance-voltage characteristics; Control systems; Expert systems; Gain measurement; Instruments; Intelligent systems; Software testing; System testing;
Conference_Titel :
Microelectronic Test Structures, 1990. ICMTS 1990. Proceedings of the 1990 International Conference on
Conference_Location :
San Diego, CA, USA
DOI :
10.1109/ICMTS.1990.67904