DocumentCode :
1844377
Title :
Derivation of interconnect length distribution in X architecture LSIs
Author :
Nakashima, Hidenari ; Takagi, Naohiro ; Masu, Kazuya
Author_Institution :
Precision & Intelligence Lab., Tokyo Inst. of Technol., Yokohama, Japan
fYear :
2003
fDate :
2-4 June 2003
Firstpage :
60
Lastpage :
62
Abstract :
The prediction model for the interconnect length distribution (ILD) in LSIs with orthogonal interconnects based on Rent´s empirical rule is extended to the prediction of ILD for the X Architecture containing diagonal interconnects and all-directional interconnects. The effectiveness of the X Architecture is evaluated based on the new prediction model.
Keywords :
integrated circuit interconnections; large scale integration; prediction theory; LSI; Rent empirical rule; X architecture; interconnect length distribution; orthogonal interconnects; prediction model; Clocks; Electronic mail; Frequency; Integrated circuit interconnections; Laboratories; Large scale integration; Logic circuits; Pins; Predictive models; Wiring;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Interconnect Technology Conference, 2003. Proceedings of the IEEE 2003 International
Print_ISBN :
0-7803-7797-4
Type :
conf
DOI :
10.1109/IITC.2003.1219713
Filename :
1219713
Link To Document :
بازگشت