DocumentCode
1844377
Title
Derivation of interconnect length distribution in X architecture LSIs
Author
Nakashima, Hidenari ; Takagi, Naohiro ; Masu, Kazuya
Author_Institution
Precision & Intelligence Lab., Tokyo Inst. of Technol., Yokohama, Japan
fYear
2003
fDate
2-4 June 2003
Firstpage
60
Lastpage
62
Abstract
The prediction model for the interconnect length distribution (ILD) in LSIs with orthogonal interconnects based on Rent´s empirical rule is extended to the prediction of ILD for the X Architecture containing diagonal interconnects and all-directional interconnects. The effectiveness of the X Architecture is evaluated based on the new prediction model.
Keywords
integrated circuit interconnections; large scale integration; prediction theory; LSI; Rent empirical rule; X architecture; interconnect length distribution; orthogonal interconnects; prediction model; Clocks; Electronic mail; Frequency; Integrated circuit interconnections; Laboratories; Large scale integration; Logic circuits; Pins; Predictive models; Wiring;
fLanguage
English
Publisher
ieee
Conference_Titel
Interconnect Technology Conference, 2003. Proceedings of the IEEE 2003 International
Print_ISBN
0-7803-7797-4
Type
conf
DOI
10.1109/IITC.2003.1219713
Filename
1219713
Link To Document