• DocumentCode
    1844566
  • Title

    Non-traditional irregular interconnects for massive scale SoC

  • Author

    Teuscher, Christof ; Hansson, Anders A.

  • Author_Institution
    Los Alamos Nat. Lab., Los Alamos, NM
  • fYear
    2008
  • fDate
    18-21 May 2008
  • Firstpage
    2785
  • Lastpage
    2788
  • Abstract
    By using self-assembling fabrication techniques at the cellular, molecular, or atomic scale, it is nowadays possible to create functional assemblies in a mainly bottom-up way that involve massive numbers of interconnected components. However, such assemblies are often highly irregular, unreliable, and heterogeneous. A grand challenge for future and emerging electronics is thus to reliably and efficiently compute and communicate in such systems. The goal of this paper is to illustrate why non-traditional network-on-chip paradigms are promising for massive scale systems and what the limits are. We have previously shown that certain irregular 3D assemblies and interconnects have major advantages over regular 2D and 3D mesh fabrics in terms of latency, throughput, scalability, and the robustness against simple link failures. We present these results from a complex network perspective and look into the scaling properties of different interconnect topologies and routing algorithms in an abstract framework. We argue that only small-world topologies will scale up to massive scale systems. The long term goal in using irregular, fabrication-friendly, and non-traditional interconnects is to eventually be able to cheaply and easily assemble massive scale computing devices that are able to solve specific large- scale problems competitively with traditional top-down fabricated silicon technology.
  • Keywords
    integrated circuit interconnections; system-on-chip; fabricated silicon technology; irregular interconnects; massive scale SoC; self-assembling fabrication techniques; Assembly; Delay; Fabrication; Fabrics; Network topology; Network-on-a-chip; Robustness; Scalability; Telecommunication network reliability; Throughput;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Circuits and Systems, 2008. ISCAS 2008. IEEE International Symposium on
  • Conference_Location
    Seattle, WA
  • Print_ISBN
    978-1-4244-1683-7
  • Electronic_ISBN
    978-1-4244-1684-4
  • Type

    conf

  • DOI
    10.1109/ISCAS.2008.4542035
  • Filename
    4542035