DocumentCode :
1844824
Title :
Repeat measurements and metrics for nonlinear model development
Author :
Remley, K.A. ; Jargon, J.A. ; Schreurs, D. ; DeGroot, D.C. ; Gupta, K.C.
Author_Institution :
Nat. Inst. of Stand. & Technol., Boulder, CO, USA
Volume :
3
fYear :
2002
fDate :
2-7 June 2002
Firstpage :
2169
Abstract :
We develop a method to study nonlinear models using metrics in conjunction with repeat measurements. We illustrate this procedure by investigating the performance of three types of measurement-based nonlinear circuit models using two different metrics.
Keywords :
semiconductor device measurement; semiconductor device models; metrics; nonlinear model; repeat measurements; Data engineering; Histograms; Impedance measurement; NIST; Nonlinear circuits; Particle measurements; Predictive models; Robustness; Semiconductor device modeling; Stochastic processes;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Symposium Digest, 2002 IEEE MTT-S International
Conference_Location :
Seattle, WA, USA
ISSN :
0149-645X
Print_ISBN :
0-7803-7239-5
Type :
conf
DOI :
10.1109/MWSYM.2002.1012301
Filename :
1012301
Link To Document :
بازگشت