DocumentCode :
1845291
Title :
Characterization of On-Wafer Diode Noise Sources
Author :
Randa, J. ; Walker, D. ; Dunleavy, L. ; Billinger, R. ; Rice, J.
Author_Institution :
Electromagnetic Fields Division, National Institute of Standards and Technology, Boulder, CO 80303
Volume :
33
fYear :
1998
fDate :
35947
Firstpage :
53
Lastpage :
61
Abstract :
A set of wafer probeable diode noise source transfer standards are characterized using on-wafer noise temperature methods developed recently at the National Institute of Standards and Technology (NIST). This paper reviews the methods for accurate on-wafer measurements of noise temperature and details the preliminary design and construction of the transfer standards. Measurements are presented of their noise temperatures at frequencies from 8 to 12 GHz. Such transfer standards could be used in interlaboratory comparisons or as a verification tool for checking on-wafer noise calibration accuracy.
Keywords :
Calibration; Cryogenics; Diodes; Electromagnetic interference; Measurement standards; NIST; Noise figure; Noise measurement; Radiometry; Temperature measurement; Noise; noise characterization; noise measurement; noise source; noise temperature; on-wafer measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
ARFTG Conference Digest-Spring, 51st
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
0-7803-5686-1
Type :
conf
DOI :
10.1109/ARFTG.1998.327277
Filename :
4119966
Link To Document :
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