• DocumentCode
    1849832
  • Title

    New repetitive POS electron accelerator for open air electron beam injection

  • Author

    Dolgachev, G.I. ; Nitishinsky, M.S. ; Ushakov, A.G.

  • Author_Institution
    Res. Center, Kurchatov (I.V.) Inst. of Atomic Energy, Moscow, Russia
  • Volume
    1
  • fYear
    1997
  • fDate
    June 29 1997-July 2 1997
  • Firstpage
    281
  • Abstract
    Repetitive plasma opening switch (RPOS) technology recently developed by Russia´s Kurchatov Institute may be useful for a wide range of pulsed power parameters. The RS-20 concept represents 2-3 MV 10-100 kW range for radiation treatment; new repetitive POS generators were proposed for over 5 MV switching voltage and a 200-300 kW beam for high dose/dose rate production. Some technical approaches allow an increase in wall-plug beam efficiency of up to 50-70%. Other applications requiring high dose rate may use a relatively compact RPOS generator for electron beam irradiation at 500-800 keV. This compact concept may reach very high peak dose rate in e-mode to obtain a sterilization dose as a function of dose rate for radiation testing. An electron repetitive accelerator using RPOS technology has 8 kJ/shot energy capacity, 120 kA drive current amplitude, 500-800 kV and 100 ns diode pulse and 0.5-1 kJ/shot in e-beam. A specially designed window capable of operating in the multi-shot regime is also created. The generator is planned to have a 1-2 kGy/pulse and a peak dose rate of 2/spl times/10/sup 4/ MGy/s. The RPOS was made coaxial using a standard repetitive plasma gun technology with a central cathode and lifetime of more than 10/sup 6/ shots.
  • Keywords
    electron accelerators; plasma guns; plasma switches; power supplies to apparatus; pulse generators; pulsed power switches; 10 to 100 kW; 100 ns; 120 kA; 2 to 3 MV; 200 to 300 kW; 500 to 800 kV; 500 to 800 keV; RS-20 concept; Russia; applications; central cathode; dose rate; drive current amplitude; electron accelerator pulsed power supply; electron beam irradiation; electron repetitive accelerator; lifetime; multi-shot regime; open air electron beam injection; radiation treatment; repetitive plasma gun technology; repetitive plasma opening switch; shot energy capacity; sterilization dose; switching voltage; wall-plug beam efficiency; Coaxial components; Diodes; Electron accelerators; Electron beams; Plasma accelerators; Production; Pulse generation; Switches; Testing; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Pulsed Power Conference, 1997. Digest of Technical Papers. 1997 11th IEEE International
  • Conference_Location
    Baltimore, MA, USA
  • Print_ISBN
    0-7803-4213-5
  • Type

    conf

  • DOI
    10.1109/PPC.1997.679334
  • Filename
    679334