Dual-scaled stable superhydrophobic nano-flower surfaces

Author

Chen, Longquan ; Xiao, Zhiyong ; Chan, Philip C.H. ; Lee, Yi-Kuen

Author_Institution

Dept of Mech. Eng., Hong Kong Univ. of Sci. & Technol., Hong Kong, China

fYear

2009

fDate

21-25 June 2009

Firstpage

441

Lastpage

444

Abstract

Novel dual-scaled superhydrophobic nano-flower surfaces were fabricated by 1-mask photolithography, DRIE and carbon nanotube (CNT) microwave plasma enhanced CVD (MPCVD). Patterned structure was characterized by SEM, TEM and AFM techniques. With the additional petal-like CNT structure, the apparent contact angle (ACA) increased dramatically compared with silicon (~140%) and parylene-coated (~78%) micropillar surfaces and resulted in a small sliding angle (around 5deg). The sliding angle and dynamic testing indicate that these nano-flower surfaces are stable superhydrophobic surfaces.

Keywords

atomic force microscopy; carbon nanotubes; masks; nanostructured materials; photolithography; plasma CVD; scanning electron microscopy; silicon; sputter etching; transmission electron microscopy; 1-mask photolithography; AFM; C; DRIE; SEM; Si; TEM; apparent contact angle; carbon nanotube; microwave plasma enhanced CVD; parylene-coated micropillar surfaces; patterned structure; superhydrophobic nanoflower surfaces; Carbon nanotubes; Fabrication; Iron; Lithography; Plasma applications; Silicon; Surface morphology; Surface treatment; Testing; USA Councils; MPCVD; Superhydrophobic surfaces; apparent contact angle; dual-scaled roughness; nano-flower;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Sensors, Actuators and Microsystems Conference, 2009. TRANSDUCERS 2009. International

Conference_Location

Denver, CO

Print_ISBN

978-1-4244-4190-7

Electronic_ISBN

978-1-4244-4193-8

Type

conf

DOI

10.1109/SENSOR.2009.5285469

Filename

5285469