DocumentCode :
1853904
Title :
Boron diffusion induced shunts
Author :
Zin, Ngwe ; Blakers, Andrew
Author_Institution :
Centre for Sustainable Energy Syst. (CSES), Australian Nat. Univ., Canberra, ACT, Australia
fYear :
2011
fDate :
19-24 June 2011
Abstract :
Various types of shunt occur in solar cells, including process errors, defects, tunnel shunts between adjacent opposing diffusions and pinholes in insulating dielectric layers used to separate opposite-polarity regions. We have found that boron diffusions into small windows in dielectric layers generate pinholes in the layers following the removal of borosilicate glass (BSG) after the diffusion. These “boron-spots” lie close to the edge of the diffusion windows. If a phosphorus diffused region underlies the dielectric then subsequent metallisation can short circuit the two regions.
Keywords :
boron; borosilicate glasses; diffusion; metallisation; phosphorus; solar cells; boron diffusion induced shunts; boron spots; borosilicate glass; diffusion windows; insulating dielectric layers; metallisation; opposite polarity regions; phosphorus diffused region; process errors; solar cells; tunnel shunts; Boron; Conferences; Dielectrics; Photovoltaic cells; Photovoltaic systems; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference (PVSC), 2011 37th IEEE
Conference_Location :
Seattle, WA
ISSN :
0160-8371
Print_ISBN :
978-1-4244-9966-3
Type :
conf
DOI :
10.1109/PVSC.2011.6185871
Filename :
6185871
Link To Document :
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