Title :
Hermetic thin film encapsulation of mechanical transducers for smart label applications
Author :
Reuter, D. ; Nowack, M. ; Rennau, M. ; Bertz, A. ; Wiemer, M. ; Kriebel, F. ; Gessner, T.
Author_Institution :
Center for Microtechnologies, Chemnitz Univ. of Technol., Chemnitz, Germany
Abstract :
For realizing an active smart RFID label monitoring mechanical shock and inclination during transport processes, a capacitive inertial sensor has been developed. Hermetic sealing of the microstructures has been done by a wafer level thin film encapsulation technology based on CF-polymer as sacrificial layer material and a stress-optimized dielectric layer stack as capping material. Long term stability of the thin film encapsulation hermeticity in dependence of the material stack was tested by measuring the pressure inside the package using the pressure dependency of viscous damping between the electrode plates. For the used material stacks containing SiOx(Hy) or SiOx(Hy)/SiNx(Hy) and sputtered aluminum a sufficient hermeticity with leak rates of 2E-10 Pamiddotl/s and 6E-12 Pamiddotl/s, respectively, could be achieved.
Keywords :
aluminium; damping; encapsulation; hermetic seals; polymers; radiofrequency identification; silicon compounds; transducers; wafer level packaging; Al; SiOx(Hy); SiOx(Hy)-SiNx(Hy); capacitive inertial sensor; electrode plates; hermetic thin film encapsulation; leak rates; mechanical transducers; sacrificial layer material; smart RFID label monitoring mechanical shock; sputtered aluminum; stress-optimized dielectric layer stack; thin film encapsulation technology; transport processes; viscous damping; Active RFID tags; Dielectric materials; Dielectric thin films; Electric shock; Encapsulation; Monitoring; Radiofrequency identification; Sealing materials; Transducers; Transistors; 2f-method; CF-polymer; hermeticity test; thin film encapsulation; wafer-level packaging;
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems Conference, 2009. TRANSDUCERS 2009. International
Conference_Location :
Denver, CO
Print_ISBN :
978-1-4244-4190-7
Electronic_ISBN :
978-1-4244-4193-8
DOI :
10.1109/SENSOR.2009.5285526