DocumentCode
1854992
Title
Optical study of Ge quantum dots and infrared photodetectors
Author
Wei, Rongshan ; Deng, Ning ; Wang, Minsheng ; Zhang, Shuang ; Chen, Peiyi
Author_Institution
Inst. of Microelectron., Tsinghua Univ., Beijing, China
fYear
2005
fDate
11-15 July 2005
Firstpage
792
Abstract
Stacked Ge quantum dots were grown on Si(100) by ultra-high vacuum chemical vapor deposition (UHV/CVD). Obvious blueshift (87 meV) observed from PL spectrum under 10 K demonstrates strong quantum confinement in Ge dots. Based on the material, PIiN structure quantum dot infrared photodetectors (QDIPs) were fabricated. At room temperature, I-V measurement showed a low dark current density of 1.7 × 10-6 A/cm2 at -3 V. The maximum photocurrent responsivity of 0.52 A/W at 774 nm was achieved, and 0.043 mA/W at 1.31 μm was found. The dots layers were considered to trap the light in the intrinsic region, and thus increase the absorption. Finally, samples of structural optimization were proposed.
Keywords
chemical vapour deposition; current density; dark conductivity; elemental semiconductors; germanium; infrared detectors; photoconductivity; photodetectors; photoluminescence; semiconductor growth; semiconductor quantum dots; spectral line shift; 1.31 micron; 10 K; 293 to 298 K; 774 nm; CVD; Ge; I-V measurement; Si; Si(100) surface; UHV; blueshift; dark current density; infrared photodetectors; photocurrent; photoluminescence spectrum; quantum confinement; quantum dots; structural optimization; ultra-high vacuum chemical vapor deposition; Chemical vapor deposition; Current measurement; Dark current; Density measurement; Elementary particle vacuum; Optical materials; Photodetectors; Potential well; Quantum dots; Temperature measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology, 2005. 5th IEEE Conference on
Print_ISBN
0-7803-9199-3
Type
conf
DOI
10.1109/NANO.2005.1500650
Filename
1500650
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