• DocumentCode
    1855274
  • Title

    Fabrication of Ni80Fe20 antidot nanostructures using KrF lithography

  • Author

    Wang, C.C. ; Adeyeye, A.O. ; Singh, N.

  • Author_Institution
    Inf. Storage Mater. Lab., Nat. Univ. of Singapore, Singapore
  • fYear
    2005
  • fDate
    11-15 July 2005
  • Firstpage
    824
  • Abstract
    We have fabricated arrays of nanometric ferromagnetic antidot structures over a very large area using KrF lithography at 248 nm exposure wavelength. The antidot structure displays novel magnetic properties which are different from the continuous film. We have characterized in detail both the magnetic and transport properties.
  • Keywords
    Permalloy; ferromagnetic materials; magnetisation reversal; nanolithography; nanostructured materials; quantum dots; 248 nm; KrF lithography; Ni80Fe20; antidot nanostructures; magnetic properties; nanometric ferromagnetic antidot structures; transport properties; Electron beams; Fabrication; Iron; Lithography; Magnetic films; Magnetic materials; Magnetic properties; Magnetic separation; Nanostructures; Resists;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology, 2005. 5th IEEE Conference on
  • Print_ISBN
    0-7803-9199-3
  • Type

    conf

  • DOI
    10.1109/NANO.2005.1500660
  • Filename
    1500660
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1855274