DocumentCode :
1855274
Title :
Fabrication of Ni80Fe20 antidot nanostructures using KrF lithography
Author :
Wang, C.C. ; Adeyeye, A.O. ; Singh, N.
Author_Institution :
Inf. Storage Mater. Lab., Nat. Univ. of Singapore, Singapore
fYear :
2005
fDate :
11-15 July 2005
Firstpage :
824
Abstract :
We have fabricated arrays of nanometric ferromagnetic antidot structures over a very large area using KrF lithography at 248 nm exposure wavelength. The antidot structure displays novel magnetic properties which are different from the continuous film. We have characterized in detail both the magnetic and transport properties.
Keywords :
Permalloy; ferromagnetic materials; magnetisation reversal; nanolithography; nanostructured materials; quantum dots; 248 nm; KrF lithography; Ni80Fe20; antidot nanostructures; magnetic properties; nanometric ferromagnetic antidot structures; transport properties; Electron beams; Fabrication; Iron; Lithography; Magnetic films; Magnetic materials; Magnetic properties; Magnetic separation; Nanostructures; Resists;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology, 2005. 5th IEEE Conference on
Print_ISBN :
0-7803-9199-3
Type :
conf
DOI :
10.1109/NANO.2005.1500660
Filename :
1500660
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1855274
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