DocumentCode
1856598
Title
Aluminum nano-cantilevers for high sensitivity mass sensors
Author
Davis, Zachary J. ; Boisen, Anja
Author_Institution
Dept. of Micro & Nanotechnology, Tech. Univ. Denmark, Lyngby, Denmark
fYear
2005
fDate
11-15 July 2005
Firstpage
126
Abstract
We have fabricated Al nano-cantilevers using a very simple one mask contact UV lithography technique with lateral dimensions under 500 nm and vertical dimensions of approximately 100 nm. These devices are demonstrated as highly sensitive mass sensors by measuring their dynamic properties. Furthermore, it is shown that Al has a potential higher sensitivity than Si based dynamic sensors. Initial testing of these devices has been conducted using a novel scanning electron microscope setup were the devices were tested under high vacuum conditions. The Q-factor was measured to approximately 200 and the mass sensitivity was measured to 2 attograms/Hz by depositing electron beam induced carbon at the end of the nano-cantilever.
Keywords
Q-factor; aluminium; cantilevers; electron beam deposition; masks; nanotechnology; scanning electron microscopy; sensors; ultraviolet lithography; Al; Q-factor; UV lithography technique; aluminum nanocantilevers fabrication; dynamic properties; dynamic sensors; electron beam deposition; lateral dimensions; mask contact; scanning electron microscope; sensitivity mass sensors; vertical dimensions; Aluminum; Electron beams; Equations; Lithography; Nanotechnology; Q factor; Resonant frequency; Scanning electron microscopy; Springs; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology, 2005. 5th IEEE Conference on
Print_ISBN
0-7803-9199-3
Type
conf
DOI
10.1109/NANO.2005.1500709
Filename
1500709
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