• DocumentCode
    1856598
  • Title

    Aluminum nano-cantilevers for high sensitivity mass sensors

  • Author

    Davis, Zachary J. ; Boisen, Anja

  • Author_Institution
    Dept. of Micro & Nanotechnology, Tech. Univ. Denmark, Lyngby, Denmark
  • fYear
    2005
  • fDate
    11-15 July 2005
  • Firstpage
    126
  • Abstract
    We have fabricated Al nano-cantilevers using a very simple one mask contact UV lithography technique with lateral dimensions under 500 nm and vertical dimensions of approximately 100 nm. These devices are demonstrated as highly sensitive mass sensors by measuring their dynamic properties. Furthermore, it is shown that Al has a potential higher sensitivity than Si based dynamic sensors. Initial testing of these devices has been conducted using a novel scanning electron microscope setup were the devices were tested under high vacuum conditions. The Q-factor was measured to approximately 200 and the mass sensitivity was measured to 2 attograms/Hz by depositing electron beam induced carbon at the end of the nano-cantilever.
  • Keywords
    Q-factor; aluminium; cantilevers; electron beam deposition; masks; nanotechnology; scanning electron microscopy; sensors; ultraviolet lithography; Al; Q-factor; UV lithography technique; aluminum nanocantilevers fabrication; dynamic properties; dynamic sensors; electron beam deposition; lateral dimensions; mask contact; scanning electron microscope; sensitivity mass sensors; vertical dimensions; Aluminum; Electron beams; Equations; Lithography; Nanotechnology; Q factor; Resonant frequency; Scanning electron microscopy; Springs; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology, 2005. 5th IEEE Conference on
  • Print_ISBN
    0-7803-9199-3
  • Type

    conf

  • DOI
    10.1109/NANO.2005.1500709
  • Filename
    1500709