DocumentCode
1857845
Title
Integration of combinatorial evaluation and MEMS technology for material search
Author
Hata, Satoshi
Author_Institution
Dept. of Micro-Nano Syst. Eng., Nagoya Univ., Nagoya, Japan
fYear
2012
fDate
4-7 Nov. 2012
Firstpage
512
Lastpage
512
Abstract
In the exploitation of micro-nano materials, there is a problem that is difficult to evaluate their properties than bulk materials. Recently, to solve the problem, fabrication of sample group which can be evaluated efficiently and high throughput evaluation using MEMS are studied by integrating MEMS and combinatorial technology. In this report, high throughput evaluation using integration of MEMS technology and combinatorial technology including recent research is introduced. Combinatorial arc plasma deposition (CAPD) was applied to deposit for compositionally-graded thin film. The deposited thin film was separated into 1,089 samples (thin film library) by lift-off process, and the thickness, composition and phase of each sample was evaluated without detaching them from the library. For evaluation of the library, various novel methods are studied. MEMS process and technology are applied to fabricate and evaluate of the samples. Customized library for measurement of crystallization temperature and high frequency fatigue test method are introduced.
Keywords
crystallisation; microfabrication; micromechanical devices; nanofabrication; nanostructured materials; plasma deposition; CAPD; MEMS technology; combinatorial arc plasma deposition; combinatorial technology; crystallization temperature; fabrication; fatigue test method; material search; micromaterials; nanomaterials; thin film deposition;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro-NanoMechatronics and Human Science (MHS), 2012 International Symposium on
Conference_Location
Nagoya
Print_ISBN
978-1-4673-4811-9
Type
conf
DOI
10.1109/MHS.2012.6492388
Filename
6492388
Link To Document