DocumentCode :
1858571
Title :
Technology evening panel discussion post scaling: What will be next? Tuesday, June 16, 20:00–22:00
fYear :
2015
fDate :
16-18 June 2015
Abstract :
Continuous efforts have been made to extend the scaling of ULSIs for the enhancement of the performance of the devices. However, it is also true that the end of the scaling of MOSFETs and BEOL interconnect is coming in near future. Since it is believed that continuous performance improvements as well as new values of LSI systems are required even in the era of post-scaling, we have to find new ways to improve and extend the function of LSIs and those efforts could lead to the innovation of electronics. Considering the issue mentioned above, we invited several experts ranging from material and device level to system and architecture level. We would like to use this opportunity to discuss on ‘What is the next? (What is the post-scaling technology?)’ together with participants all over the world.
Keywords :
Distance measurement; Google; MOSFET; Performance evaluation; Technological innovation; Ultra large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology (VLSI Technology), 2015 Symposium on
Conference_Location :
Kyoto, Japan
ISSN :
0743-1562
Type :
conf
DOI :
10.1109/VLSIT.2015.7223719
Filename :
7223719
Link To Document :
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