DocumentCode
1858571
Title
Technology evening panel discussion post scaling: What will be next? Tuesday, June 16, 20:00–22:00
fYear
2015
fDate
16-18 June 2015
Abstract
Continuous efforts have been made to extend the scaling of ULSIs for the enhancement of the performance of the devices. However, it is also true that the end of the scaling of MOSFETs and BEOL interconnect is coming in near future. Since it is believed that continuous performance improvements as well as new values of LSI systems are required even in the era of post-scaling, we have to find new ways to improve and extend the function of LSIs and those efforts could lead to the innovation of electronics. Considering the issue mentioned above, we invited several experts ranging from material and device level to system and architecture level. We would like to use this opportunity to discuss on ‘What is the next? (What is the post-scaling technology?)’ together with participants all over the world.
Keywords
Distance measurement; Google; MOSFET; Performance evaluation; Technological innovation; Ultra large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology (VLSI Technology), 2015 Symposium on
Conference_Location
Kyoto, Japan
ISSN
0743-1562
Type
conf
DOI
10.1109/VLSIT.2015.7223719
Filename
7223719
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