DocumentCode :
1858695
Title :
InAlAs epitaxial growth for wide band gap solar cells
Author :
Leite, Marina S. ; Woo, Robyn L. ; Hong, William D. ; Law, Daniel C. ; Atwater, Harry A.
Author_Institution :
Thomas J. Watson Labs. of Appl. Phys., California Inst. of Technol., Pasadena, CA, USA
fYear :
2011
fDate :
19-24 June 2011
Abstract :
We demonstrate high quality InAlAs epitaxial growth by metalorganic vapor phase epitaxy and wide band gap solar cell fabrication. X-ray diffraction and transmission electron microscopy were used to characterize the crystalline quality of the epitaxial InAlAs grown. InAlAs solar cells lattice-matched to InP were grown and electrically characterized under AM 1.5 global 1-sun illumination. Window layers with different composition and, therefore, band gap energies were used to compare its effect on the overall device performance. In order to improve the electrical contact at the top window (Al-rich), an InGaAs cap layer was used. The resulting first generation of InAlAs solar cells showed an efficiency higher than 14 %, open circuit voltage of Voc = 1 V, Jsc = 19.3 mA/cm2, and maximum external quantum efficiency of 81 %.
Keywords :
III-V semiconductors; X-ray diffraction; indium compounds; solar cells; transmission electron microscopy; vapour phase epitaxial growth; InAlAs; InP; X-ray diffraction; electrical contact; epitaxial growth; metalorganic vapor phase epitaxy; open circuit voltage; transmission electron microscopy; wide band gap solar cell fabrication; Epitaxial growth; Indium compounds; Indium phosphide; Metals; Photonic band gap; Photovoltaic cells; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference (PVSC), 2011 37th IEEE
Conference_Location :
Seattle, WA
ISSN :
0160-8371
Print_ISBN :
978-1-4244-9966-3
Type :
conf
DOI :
10.1109/PVSC.2011.6186070
Filename :
6186070
Link To Document :
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