DocumentCode :
1858872
Title :
Fabrication of carbon nanowalls by dc plasma-enhanced chemical vapor deposition and characterization of their structures
Author :
Yoshimura, Akihiko ; Kurita, Satoshi ; Tachibana, Masaru ; Kojima, Kenichi ; Molina-Morales, Pedro ; Nakai, Hiroshi
Author_Institution :
Graduate Sch. of Integrated Sci., Yokohama City Univ., Japan
fYear :
2005
fDate :
11-15 July 2005
Firstpage :
482
Abstract :
Two-dimensional carbon nanostructures called carbon nanowalls (CNWs) were fabricated using dc plasma-enhanced chemical vapor deposition with a gas mixture of CH4, H2 and Ar. CNWs were vertically grown on quartz and Si substrates at temperatures of 500 to 800°C. The size of CNWs was controlled by growth conditions such as CH4/H2 ratio and substrate temperature. The structures of CNWs were characterized by Raman spectroscopy. The spectral features of CNWs are distinguished from those of typical graphite-like carbons reported so far. From the comparison of the spectral features, it is shown that CNWs are composed of small crystallites with a high degree of graphitization.
Keywords :
Raman spectra; carbon; graphitisation; nanostructured materials; nanotechnology; plasma CVD; 500 to 800 degC; C; CH4/H2 ratio; Raman spectroscopy; Si substrates; carbon nanowalls; crystallites; dc plasma-enhanced chemical vapor deposition; gas mixture; graphite-like carbons; graphitization; quartz substrates; structures; substrate temperature; two-dimensional carbon nanostructures; vertical growth; Argon; Chemical vapor deposition; Fabrication; Nanostructures; Plasma chemistry; Plasma temperature; Raman scattering; Size control; Spectroscopy; Temperature control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology, 2005. 5th IEEE Conference on
Print_ISBN :
0-7803-9199-3
Type :
conf
DOI :
10.1109/NANO.2005.1500805
Filename :
1500805
Link To Document :
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