• DocumentCode
    1859122
  • Title

    Design and characterization of metal-molecule-silicon devices

  • Author

    Scott, Adina ; Janes, David

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Purdue Univ., West Lafayette, IN, USA
  • fYear
    2005
  • fDate
    11-15 July 2005
  • Firstpage
    515
  • Abstract
    The use of molecular devices for computation shows promise for miniaturizing electronic devices and enhancing integrated circuit functionality. While a majority of molecular devices presented to date employ metal contacts, the use of semiconductor contacts could allow for more stable chemical bonds and improved electrical properties. In this study, we present the grafting and characterization of molecular layers on hydrogenated silicon surfaces using procedures found in the literature. We present the development, fabrication, and measurement of metal-molecule-silicon device structures using traditional lithographic techniques.
  • Keywords
    bonds (chemical); electrical contacts; elemental semiconductors; lithography; molecular electronics; semiconductor devices; silicon; electrical properties; electronic devices; grafting; hydrogenated silicon surfaces; integrated circuit functionality; lithographic techniques; metal contacts; metal-molecule-silicon devices; molecular devices; molecular layers; semiconductor contacts; stable chemical bonds; Bonding; CMOS technology; Chemicals; Contacts; Electrodes; Etching; Molecular electronics; Probability distribution; Silicon; Wire;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology, 2005. 5th IEEE Conference on
  • Print_ISBN
    0-7803-9199-3
  • Type

    conf

  • DOI
    10.1109/NANO.2005.1500814
  • Filename
    1500814