DocumentCode
1859122
Title
Design and characterization of metal-molecule-silicon devices
Author
Scott, Adina ; Janes, David
Author_Institution
Dept. of Electr. & Comput. Eng., Purdue Univ., West Lafayette, IN, USA
fYear
2005
fDate
11-15 July 2005
Firstpage
515
Abstract
The use of molecular devices for computation shows promise for miniaturizing electronic devices and enhancing integrated circuit functionality. While a majority of molecular devices presented to date employ metal contacts, the use of semiconductor contacts could allow for more stable chemical bonds and improved electrical properties. In this study, we present the grafting and characterization of molecular layers on hydrogenated silicon surfaces using procedures found in the literature. We present the development, fabrication, and measurement of metal-molecule-silicon device structures using traditional lithographic techniques.
Keywords
bonds (chemical); electrical contacts; elemental semiconductors; lithography; molecular electronics; semiconductor devices; silicon; electrical properties; electronic devices; grafting; hydrogenated silicon surfaces; integrated circuit functionality; lithographic techniques; metal contacts; metal-molecule-silicon devices; molecular devices; molecular layers; semiconductor contacts; stable chemical bonds; Bonding; CMOS technology; Chemicals; Contacts; Electrodes; Etching; Molecular electronics; Probability distribution; Silicon; Wire;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology, 2005. 5th IEEE Conference on
Print_ISBN
0-7803-9199-3
Type
conf
DOI
10.1109/NANO.2005.1500814
Filename
1500814
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