Title :
A CMOS-MEMS arrayed RGFET
Author :
Chi-Hang Chin ; Sheng-Shian Li
Author_Institution :
Inst. of NanoEngineering & Microsyst., Nat. Tsing Hua Univ., Hsinchu, Taiwan
Abstract :
To greatly enhance the performance of our previously developed CMOS-MEMS resonant gate field effect transistor (RGFET) [1], a novel CMOS-MEMS RGFET array which combines a metal/oxide composite resonant-gate arrayed structure and a FET arrayed transducer has been proposed for the first time utilizing the TSMC 0.35 μm CMOS technology together with a series of maskless wet etching processes. To resemble the function of a normal transistor, a “floating gate operation” was adopted to activate the transistor working at its saturation region. With proper drive and bias conditions, the measured transmission shows a resonance with Q around 1,000 and the signal-to-feedthrough ratio greater than 30 dB under a direct two-port measurement setup. As compared to the purely capacitive readout, the arrayed RGFET exhibits a 19-dB enhancement in terms of the insertion loss. With such a decent result, we do believe the CMOS-MEMS arrayed RGFET would bring simplicity and performance enhancement due to one transistor configuration for the future MEMS oscillator applications.
Keywords :
CMOS integrated circuits; field effect transistors; micromechanical devices; CMOS-MEMS RGFET array; CMOS-MEMS arrayed RGFET; CMOS-MEMS resonant gate field effect transistor; FET arrayed transducer; MEMS oscillator applications; TSMC 0.35 μm CMOS technology; direct two-port measurement setup; floating gate operation; insertion loss; maskless wet etching processes; metal-oxide composite resonant-gate arrayed structure; size 0.35 mum; Arrays; Field effect transistors; Logic gates; Q measurement; Signal to noise ratio; Wet etching;
Conference_Titel :
Frequency Control Symposium (FCS), 2014 IEEE International
Conference_Location :
Taipei
DOI :
10.1109/FCS.2014.6859930