Title :
Mechanical degrandation mechanism of aluminum-alloy structural films evaluated by environment-controlled tensile testing
Author :
Kaibara, Y. ; Fujii, H. ; Namazu, T. ; Tomizawa, Y. ; Masunishi, K. ; Inoue, S.
Author_Institution :
Dept. of Mech. & Syst. Eng., Univ. of Hyogo, Kobe, Japan
Abstract :
This paper describes the mechanical degradation mechanism of sputtered aluminum-alloy (Al-alloy) film used as a structural material in microelectromechanical systems (MEMS). The environment-controlled uniaxial tensile test system with elongation measurement image analysis function was developed to investigate the material characteristics at temperatures ranging from room temperature (RT) to 358 K. From the quasi-static tensile test results, no specimen size effect on Young´s modulus and yield stress was found, whereas the annealing and temperature influences were clearly observed. To investigate mechanical degradation to cycling loading, the cyclic loading tests were conducted under constant stress-and strain-amplitude modes. In constant stress-amplitude mode, stain amplitude increased with an increase of loading cycles due to creep-like deformation. Almost of the specimens fractured during the tests. Meanwhile, in constant strain-amplitude mode, stress amplitude gradually decreased with increasing cycles due to stress relaxation, but no fatigue failure was found. The cyclic loading and stress relaxation tests revealed that creep deformation was dominant in the degradation of Al-alloy film subjected to cyclic motion.
Keywords :
Young´s modulus; aluminium alloys; annealing; creep; deformation; elongation; fatigue; fracture; metallic thin films; micromechanical devices; stress relaxation; tensile strength; tensile testing; yield stress; AlJkJk; MEMS; Young´s modulus; aluminum-alloy structural films; annealing; creep deformation; cyclic loading tests; elongation; environment-controlled tensile testing; fatigue failure; fracture; mechanical degradation mechanism; microelectromechanical systems; strain-amplitude modes; stress relaxation; stress-amplitude modes; stress-strain curves; temperature 293 K to 358 K; yield stress; Degradation; Image motion analysis; Materials testing; Microelectromechanical systems; Micromechanical devices; Size measurement; Stress measurement; System testing; Temperature distribution; Tensile stress; Al-alloy film; Creep deformation; Degradation; Fatigue test; Image analysis; Stress relaxation test; Tensile test;
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems Conference, 2009. TRANSDUCERS 2009. International
Conference_Location :
Denver, CO
Print_ISBN :
978-1-4244-4190-7
Electronic_ISBN :
978-1-4244-4193-8
DOI :
10.1109/SENSOR.2009.5285732