DocumentCode
1859755
Title
The effect of cathode deposition on the behavior of field emission
Author
Takahashi, E. ; Ebe, A. ; Ogata, K. ; Hayashi, Y. ; Sone, M.
Author_Institution
Musashi Inst. of Technol., Tokyo, Japan
fYear
1994
fDate
23-26 Oct 1994
Firstpage
705
Lastpage
710
Abstract
It is shown that cathode deposition by the ion vapour deposition method makes the number of field emission sites decrease and also makes field emission difficult. The number of electron emitted from individual site are also decreased by cathode deposition. It is predicted that the metallic whisker model and the non-metallic model are intermingled in the field emission of a normal cathode
Keywords
electron field emission; cathode; field emission; ion vapour deposition; metallic whisker model; nonmetallic model; surface condition; Cathodes; Charge-coupled image sensors; Chemicals; Electric breakdown; Electron emission; Electrostatics; Oscilloscopes; Predictive models; Surface discharges; Vacuum breakdown;
fLanguage
English
Publisher
ieee
Conference_Titel
Electrical Insulation and Dielectric Phenomena, 1994., IEEE 1994 Annual Report., Conference on
Conference_Location
Arlington, TX
Print_ISBN
0-7803-1950-8
Type
conf
DOI
10.1109/CEIDP.1994.592052
Filename
592052
Link To Document