DocumentCode
1859953
Title
Design and fabrication of micro carbon nanotube column for electron-beam lithography
Author
Yao, B.C. ; Wang, C.P. ; Tseng, S.C. ; Tsai, C.H.
Author_Institution
Center for Meas. Stand., Ind. Technol. Res. Inst., Hsinchu, Taiwan
fYear
2005
fDate
11-15 July 2005
Firstpage
673
Abstract
This articles describes the preliminary design and fabrication results of micro carbon-nano-tube (CNT) column for electron-beam lithography. The column consists of gated single vertical aligned CNT electron source and one metal electrostatic lens. The CNT electron source was fabricated by combination of optical lithography, electron-beam writing and inductively coupled plasma chemical vapor deposition (ICP-CVD) growth. The simulated minimum spot size was 80 nm with one metal electrostatic lens for a 40 nm diameter CNT.
Keywords
carbon nanotubes; electron beam lithography; electrostatic lenses; nanolithography; photolithography; plasma CVD; 40 nm; 80 nm; C; CNT electron source; electron-beam lithography; electron-beam writing; inductively coupled plasma chemical vapor deposition; metal electrostatic lens; microcarbon nanotube column; optical lithography; Carbon nanotubes; Electron optics; Electron sources; Electrostatics; Lenses; Lithography; Optical coupling; Optical device fabrication; Plasma chemistry; Writing;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology, 2005. 5th IEEE Conference on
Print_ISBN
0-7803-9199-3
Type
conf
DOI
10.1109/NANO.2005.1500847
Filename
1500847
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