DocumentCode :
1860245
Title :
An estimation for EUV radiation energy using FLN
Author :
Zhang, C.H. ; Katsuki, S. ; Horita, H. ; Kimura, A. ; Namihira, T. ; Akiyama, H.
Author_Institution :
Dept. of Electr. & Comput. Eng., Kumamoto Univ., Japan
fYear :
2005
fDate :
11-15 July 2005
Firstpage :
689
Abstract :
Recently, a Z-pinch GDPP light source as EUV for next generation lithography has being developed in our lab. However, the physics of the processes, plasma and surface discharges produced, magneto-hydrodynamic, photon radiation transport, and plasma-electrode interactions, which lead to EUV emission, is intrinsically complex. Many simplifying assumption are inevitable with numerical simulations, resulting in low-credibility outcomes. A FLN with GI learning algorithm has been first employed to construct a predictive model of EUV radiation energy and to overcome the uncertainty of the operational parameters. The research shows that EUV radiation energy can be effectively estimated by using FLN.
Keywords :
Z pinch; lithography; magnetohydrodynamics; neural nets; surface discharges; ultraviolet radiation effects; EUV radiation energy; FLN; GI learning algorithm; Z-pinch GDPP light source; functional link network; lithography; magnetohydrodynamics; photon radiation transport; plasma discharges; plasma-electrode interactions; surface discharges; Fault location; Light sources; Lithography; Numerical simulation; Physics; Plasma simulation; Plasma sources; Plasma transport processes; Predictive models; Surface discharges;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology, 2005. 5th IEEE Conference on
Print_ISBN :
0-7803-9199-3
Type :
conf
DOI :
10.1109/NANO.2005.1500859
Filename :
1500859
Link To Document :
بازگشت