Title :
Pulsed force mode AFM characterization of photopatterned polymers films
Author :
Soppera, Olivier ; Carré, Christiane
Author_Institution :
Departement de Photochimie Gen., CNRS, Mulhouse, France
Abstract :
This paper demonstrates the potentiality of AFM used in pulsed force mode (PFM) to investigate the structure of photopatterned polymer at a submicroscopic scale. This technique provides, simultaneously to the surface corrugation analysis, a measure of the local mechanical properties of the material (stiffness and adhesion). Pulsed force mode was particularly interesting for the study of polymeric optical diffractive elements, created by interference between two laser beams. In this case, PFM provides characterizations complementary to those obtained by optical measurements or by UV-visible or FTIR spectroscopies giving rise only to average values of the grating parameters. It was also demonstrated that systems with complex geometry can be investigated using the same procedure.
Keywords :
Fourier transform spectra; adhesion; atomic force microscopy; diffraction gratings; diffractive optical elements; elasticity; infrared spectra; light interference; optical films; optical polymers; polymer films; ultraviolet spectra; visible spectra; FTIR spectroscopies; UV-visible spectroscopies; adhesion; grating parameters; interference between two laser beams; photopatterned polymers films; polymeric optical diffractive elements; pulsed force mode AFM characterization; stiffness; surface corrugation analysis; Adhesives; Atomic force microscopy; Corrugated surfaces; Mechanical factors; Mechanical variables measurement; Optical films; Optical materials; Optical polymers; Optical pulses; Polymer films;
Conference_Titel :
Nanotechnology, 2005. 5th IEEE Conference on
Print_ISBN :
0-7803-9199-3
DOI :
10.1109/NANO.2005.1500863