• DocumentCode
    1860605
  • Title

    Analysis of root causes of alpha sensitivity variations on microprocessors manufactured using different cell layouts

  • Author

    Rech, P. ; Grosso, M. ; Melchiori, F. ; Loparco, D. ; Appello, D. ; Dilillo, L. ; Paccagnella, A. ; Reorda, M. Sonza

  • Author_Institution
    LIRMM, Univ. Montpellier 2, Montpellier, France
  • fYear
    2010
  • fDate
    5-7 July 2010
  • Firstpage
    29
  • Lastpage
    34
  • Abstract
    This paper reports and analyzes the results of alpha radiation testing campaigns on an embedded microprocessor manufactured with different standard cell libraries, each one enforcing Design for Manufacturing rules at a specific level. A set of analog simulations has been performed on flip-flops built with different physical layouts to reproduce and evaluate the effects of ionizing particles. The results of simulation experiments are presented and discussed, highlighting the configurations which are more likely to improve the system reliability, and then compared with radiation experiments data. Finally, we give a physical interpretation of the observed variations on radiation sensitivity.
  • Keywords
    alpha-particle effects; design for manufacture; embedded systems; flip-flops; integrated circuit layout; integrated circuit manufacture; integrated circuit reliability; integrated circuit testing; microprocessor chips; radiation hardening (electronics); alpha radiation testing; alpha sensitivity variation; analog simulations; cell layout; design for manufacturing; embedded microprocessor; flip flops; ionizing particle effect; radiation sensitivity; system reliability; Error analysis; Flip-flops; Layout; Libraries; Microprocessors; Optimization; Transistors; Design for Manufacturing; Single Event Upset; microprocessor; radiation testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    On-Line Testing Symposium (IOLTS), 2010 IEEE 16th International
  • Conference_Location
    Corfu
  • Print_ISBN
    978-1-4244-7724-1
  • Type

    conf

  • DOI
    10.1109/IOLTS.2010.5560236
  • Filename
    5560236