Title :
Highly reliable and manufacturable in-line wafer-level hermetic packages for RF MEMS variable capacitor
Author :
Kojima, Akihiro ; Shimooka, Yoshiaki ; Sugizaki, Yoshiaki ; Endo, Mitsuyoshi ; Yamazaki, Hiroaki ; Ogawa, Etsuji ; Ikehashi, Tamio ; Ohguro, Tatsuya ; Obata, Susumu ; Miyagi, Takeshi ; Mori, Ikuo ; Toyoshima, Yoshiaki ; Shibata, Hideki
Author_Institution :
Center for Semicond. R&D, Toshiba Corp., Yokohama, Japan
Abstract :
In this paper, we report a thin-film encapsulation technology for wafer-level microelectromechanical systems (MEMS) variable capacitor package. The electrical characteristics of MEMS are adversely affected by moisture. In order to prevent moisture from permeating into a package, the top surface was protected with a plasma-enhanced chemical vapor deposition (PE-CVD) SiN layer. The developed packages become a hybrid thin-film hermetic encapsulation consisting of an internal shell using PE-CVD SiO, a seal layer coating with resin, and an external protective layer formed by PE-CVD SiN. The process is fully compatible with standard low-cost back-end-of-the-line (BEOL) technologies for LSIs as a wafer-level package (WLP). This hybrid structure was very effective for protecting the MEMS device from external moisture. Moreover, the electrode surface area has to be wide, because a wide range of capacities is necessary in MEMS variable capacitors. We have developed a large (1480 times 1080 mum) hermetic thin-film encapsulation as WLP.
Keywords :
capacitors; circuit reliability; encapsulation; micromechanical devices; plasma CVD; silicon compounds; thin films; wafer level packaging; LSI; RF MEMS variable capacitor; SiN; SiO; electrical characteristics; electrode surface area; inline wafer-level hermetic packages; low-cost back-end-of-the-line technologies; plasma-enhanced chemical vapor deposition; resin; seal layer coating; thin-film encapsulation technology; wafer-level microelectromechanical systems; wafer-level package; Capacitors; Encapsulation; Manufacturing; Micromechanical devices; Moisture; Packaging; Protection; Radiofrequency microelectromechanical systems; Transistors; Wafer scale integration; hermetic encapsulation; stiction; wafer-level package (WLP);
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems Conference, 2009. TRANSDUCERS 2009. International
Conference_Location :
Denver, CO
Print_ISBN :
978-1-4244-4190-7
Electronic_ISBN :
978-1-4244-4193-8
DOI :
10.1109/SENSOR.2009.5285778