DocumentCode
1861367
Title
70% read margin enhancement by VTH mismatch self-repair in 6T-SRAM with asymmetric pass gate transistor by zero additional cost, post-process, local electron injection
Author
Miyaji, Kousuke ; Tanakamaru, Shuhei ; Honda, Kentaro ; Miyano, Shinji ; Takeuchi, Ken
Author_Institution
Univ. of Tokyo, Tokyo, Japan
fYear
2010
fDate
16-18 June 2010
Firstpage
41
Lastpage
42
Abstract
A VTH mismatch self-repair scheme in 6T-SRAM with asymmetric PG transistor by post-process local electron injection is proposed for the first time. The asymmetric VTH shift is doubled from the conventional scheme without process and area penalty. Measurement results show 24% increase in SNM without write degradation by the asymmetric PG transistor. 70% read margin enhancement is achieved by the proposed scheme.
Keywords
MOSFET; SRAM chips; 6T-SRAM; asymmetric pass gate transistor; asymmetric shift; local electron injection; mismatch self-repair; post-process; read margin enhancement; zero additional cost; Current measurement; Degradation; Dielectric measurements; Logic gates; Random access memory; Stability analysis; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Circuits (VLSIC), 2010 IEEE Symposium on
Conference_Location
Honolulu, HI
Print_ISBN
978-1-4244-5454-9
Type
conf
DOI
10.1109/VLSIC.2010.5560266
Filename
5560266
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