• DocumentCode
    1862356
  • Title

    GaN RF device technology and applications, present and future

  • Author

    Green, Bruce ; Moore, Kevin ; Hill, D. ; CdeBaca, Monica ; Schultz, Jamie

  • Author_Institution
    RF, Freescale Semicond., Tempe, AZ, USA
  • fYear
    2013
  • fDate
    Sept. 30 2013-Oct. 3 2013
  • Firstpage
    101
  • Lastpage
    106
  • Abstract
    Over the last decade, Gallium Nitride (GaN) has emerged as a mainstream RF technology with disruptive performance potential. Here, we present GaN technology in the context of current commercial RF communications applications as well as future applications. We show state of the art >200W, >75% efficient packaged device performance at 2.14 GHz using a 0.6 μm 48 V technology and apply the device technology to a 400 W ultra-small footprint Doherty power amplifier. We also describe extending the 0.6 μm technology to a 0.2 μm gate length that allows for higher fT that will enable future technology for high-efficiency switch-mode amplifiers.
  • Keywords
    III-V semiconductors; UHF power amplifiers; gallium compounds; wide band gap semiconductors; GaN; RF device technology; commercial RF communications applications; frequency 2.14 GHz; high-efficiency switch-mode amplifiers; power 400 W; size 0.2 mum; size 0.6 mum; ultra-small footprint Doherty power amplifier; voltage 48 V; Gain; Gallium nitride; HEMTs; Logic gates; MODFETs; Performance evaluation; Radio frequency; GaN; Power Amplifier; SiC;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Bipolar/BiCMOS Circuits and Technology Meeting (BCTM), 2013 IEEE
  • Conference_Location
    Bordeaux
  • ISSN
    1088-9299
  • Print_ISBN
    978-1-4799-0126-5
  • Type

    conf

  • DOI
    10.1109/BCTM.2013.6798154
  • Filename
    6798154