Title :
157-nm photosensitivity in germanosilicate planar waveguides
Author :
Ness, S. ; Herman, Peter R.
Author_Institution :
Dept. of Electr. & Comput. Eng., Toronto Univ., Ont., Canada
Abstract :
Summary form only given. This paper presents new results on the photosensitivity responses of waveguides and bulk glasses driven by 157 nm radiation from an F/sub 2/ laser. Single-mode slab waveguides were irradiated at various dose levels using a nitrogen-purged beam line. No enhancement techniques were employed to increase the photosensitivity response. Index changes were measured using a prism coupler technique (for waveguides) or by monitoring the diffraction efficiency of laser-induced Bragg gratings with a He-Ne laser probe beam. Surfaces were also examined by optical microscopy and atomic force microscopy (AFM).
Keywords :
Bragg gratings; atomic force microscopy; germanate glasses; optical microscopy; optical planar waveguides; refractive index; silicon compounds; 157 nm; F/sub 2/ laser radiation; GeO/sub 2/-SiO/sub 2/; He-Ne laser probe beam; atomic force microscopy; bulk glasses; diffraction efficiency; germanosilicate; laser-induced Bragg gratings; nitrogen-purged beam line; optical microscopy; photosensitivity; planar waveguides; prism coupler technique; refractive index; single-mode slab waveguides; Atom optics; Atomic force microscopy; Glass; Laser beams; Laser transitions; Optical microscopy; Optical waveguides; Planar waveguides; Slabs; Waveguide lasers;
Conference_Titel :
Lasers and Electro-Optics, 1999. CLEO '99. Summaries of Papers Presented at the Conference on
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
1-55752-595-1
DOI :
10.1109/CLEO.1999.833902